Inductively Coupled Plasma Techniques: ICP-AES and ICP-MS
Mining, metallurgical and water laboratories across Africa rely on ICP-AES and ICP-MS for trace element analysis, from ore grade control to drinking water compliance. This five day course builds a working understanding of plasma generation, sample introduction, spectral and mass interferences, and quantitation strategies, enabling analysts to operate both techniques confidently and select the right tool for the sample matrix.
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Explain the fundamentals of plasma generation and ion or photon detection in ICP systems.
Prepare samples and standards suitable for trace and ultra trace element analysis.
Recognise spectral interferences in ICP-AES and mass interferences in ICP-MS.
Apply interference correction and internal standardisation techniques to improve accuracy.
Operate ICP-AES and ICP-MS instruments for routine multi element determinations.
Select the appropriate technique and calibration approach for a given sample matrix.
Course outline
01Plasma Generation and Sample Introduction
02ICP-AES Optics and Detection
03ICP-MS Mass Analysers and Detection
04Spectral and Mass Interferences
05Interference Correction Techniques
06Calibration and Internal Standardisation
07Method Selection for Sample Matrices
08Troubleshooting and Routine Maintenance
Who should attend
This course is designed for analytical chemists, instrument technicians and R&D staff performing trace element analysis in mining, metallurgical, water or environmental laboratories.
Fees are per delegate. South African venues are priced in rand; other locations and online in US dollars. Fees exclude 15% VAT where applicable. Group bookings of three or more delegates from the same organisation qualify for a reduced rate; contact us for a quotation.
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